Postdoctoral Fellow for EUV Nanolithography

The Paul Scherrer Institute PSI is the largest research institute for natural and engineering sciences within Switzerland. We perform cutting-edge research in the fields of future technologies, energy and climate, health innovation and fundamentals of nature. By performing fundamental and applied research, we work on sustainable solutions for major challenges facing society, science and economy. PSI is committed to the training of future generations. Therefore, about one quarter of our staff are post-docs, post-graduates or apprentices. Altogether, PSI employs 2300 people. 

Postdoctoral Fellow for EUV Nanolithography

Your tasks

• Development of EUV and beyond EUV masks or single-digit nanometer EUV interference lithography, zone plates for direct EUV writing as well as masks for EUV holography using advanced e-beam lithography and nanofabrication techniques 
• Initiation and participation in experiments at the XIL-II beamline  
• Participation in the commissioning and further development of the new EUV lithography tool at PSI 
• User support under the NFFA project 
• Close cooperation with internal and external partners 
• Performing research of highest quality and publication in high impact factor journals and international conferences

Your profile

• You have a PhD degree in science or engineering and you have a keen interest in applied research in nanoscience and technology
• You have hands-on experience in nanolithography and nanofabrication
• You are looking for new challenges and you are eager to learn new methods
• You are a highly motivated team player with good communication and organization skills
• Experience in some of the following fields will be of advantage: electron beam lithography, EUV lithography, X-ray optics, nanofabrication techniques, nanocharacterization including AFM and SEM, synchrotron-based methods

We offer

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