PhD – student: Digital Holographic Microscopy for optical metrology

Optical metrology is a key ingredient of nanolithography, as it enables control of important parameters like overlay. High-resolution imaging is an essential part of optical metrology since metrology is often done on small test patterns that are surrounded by device structures.

Digital Holographic Microscopy (DHM) is a promising approach for optical metrology, as it can computationally correct imaging errors that are caused by small imperfections in the imaging optics. In this way, DHM offers the near perfect imaging conditions that is required for accurate and robust metrology.

As a PhD student, you will push DHM metrology capabilities to new unexplored limits by extending DHM with multi-wavelength imaging capabilities. You will build a DHM setup that collects images at many wavelengths on relevant test samples and you will use this data to explore and evaluate new resolution enhancement techniques that are needed for robust and accurate metrology on small test patterns. You will work in close collaboration with a PhD candidate that will be investigating optical depth profiling methodologies at VU Amsterdam. The results of your research will pave the way for better metrology tools for tomorrow’s nanolithography.

You have (or soon will have) a MSc physics or applied physics. Knowledge of (computational) microscopy, experimental optics, and/or semiconductor metrology is advantageous. Programming skills (Python or Matlab) are welcomed. Good verbal and written communication skills (in English) are required.

ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe.
www.arcnl.nl (http://www.arcnl.nl)

The Computational Imaging group at ARCNL is part of the ARCNL metrology research department and explores advanced imaging techniques that offer solutions to various complex optical metrology challenges in the semiconductor manufacturing industry.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,884 per month and a
range of employment benefits (https://www.nwo-i.nl/en/working-at-nwo-i/jobsatnwoi/)
. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

For further information about the position, please contact Arie den Boef (
[email protected] (mailto:[email protected])
) or Simon Mathijssen (
[email protected] (mailto:[email protected])
).

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ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.