Advanced Research Center for Nanolithography (ARCNL)

This fully funded PhD position is part of a Holland High Tech (TKI HTSM) grant titled “Imaging Spectroscopy for Broadband EUV Source Size Characterization (ImSpec)”, a collaboration between the Advanced Research Center for Nanolithography (ARCNL) and University of Twente (UT). Laser-produced tin plasmas are the sources of extreme ultraviolet (EUV) radiation at 13.5-nm wavelength powering....

Work Activities ————— The goal of the project is to learn more about the possible detrimental effects of electrons in scanning electron microscopy for metrology applications, on materials used in the semiconductor industry. As a PhD student you will use state of the art tools to unravel and quantify the physical and chemical changes at....

Work Activities ————— In semiconductor device manufacturing, metrology tools are required for wafer alignment, overlay and device inspection. As devices become more complicated and as stronger light sources are being used to get sufficient signal from samples covered with optically opaque layers, optical damage can occur. Catastrophic damage is easily detected. However, there are forms....

This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Consolidator Grant from the European Research Council titled “Next-Generation Light Source: Driving plasmas to power tomorrow’s nanolithography (MOORELIGHT)”. Background Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength.....

Optical metrology is a key ingredient of nanolithography, as it enables the characterization of critical features of nanostructures printed on wafers. High-resolution imaging is an essential part of optical metrology: We need to perform fast imaging with the highest spatial resolution through a simple and compact imaging probe. Computational imaging is a promising new approach....

Work ActivitiesAs electronic chips continue to shrink while becoming increasingly powerful, their fabrication depends on achieving sub-nanometer precision at high speed and efficiency. At the heart of this technological challenge lies the need for accurate and reliable metrology guided by cutting-edge computational methods.Recent breakthroughs in Machine Learning enable powerful physics-informed models capable of solving the....

Work ActivitiesAre you interested in simultaneously unraveling the fundamentals of wear and contributing to the solution of friction-related challenges in computer chip production?At the Advanced Research Center for Nanolithography, we work with ASML on new processes to fabricate the electronic chips that power nearly every sector in the world. These chips are fabricated onto silicon....

The goal of the project is to better understand charging of surfaces and how it affects materials properties such as secondary electron emission in the context of scanning electron microscopy for metrology applications. The experiments on materials used in the semiconductor industry will be interpreted in the context of electron scattering simulations performed by collaboration....

This postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Consolidator Grant from the European Research Council titled “Next-Generation Light Source: Driving plasmas to power tomorrow’s nanolithography (MOORELIGHT)”. Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength. The recent revolutionary....

Work ActivitiesBackgroundIn semiconductor device manufacturing, optical metrology tools are used determine the position of a Si wafer by measuring light, scattered from so-called alignment markers. When these markers become covered in materials that are optically opaque, measuring scattered light becomes a challenge. A possible solution to that challenge is the use of photoacoustics. There, a....

Work ActivitiesWhat are the atomic-scale processes behind light-induced damage?Light-induced damage presents a challenge in applications of high-power lasers, including semiconductor device manufacturing. For the prevention of damage, it is particularly interesting to identify the changes to materials before any degradation of performance is discernible. The emergence of damage is often attributed to the creation of....

Optical metrology is a key ingredient of nanolithography, as it enables control of important parameters like overlay. High-resolution imaging is an essential part of optical metrology since metrology is often done on small test patterns that are surrounded by device structures. Digital Holographic Microscopy (DHM) is a promising approach for optical metrology, as it can....

Are you interested in simultaneously unraveling the fundamentals of wear and contributing to the solution of friction-related challenges in computer chip production? At the Advanced Research Center for Nanolithography, we work with ASML on new processes to fabricate the electronic chips that power nearly every sector in the world. These chips are fabricated onto silicon....

This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Consolidator Grant from the European Research Council titled “Next-Generation Light Source: Driving plasmas to power tomorrow’s nanolithography (MOORELIGHT)”. Background Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength.....

Work ActivitiesThe High-harmonic generation and EUV science group at ARCNL, Amsterdam, has openings for two positions for postdoctoral researchers (2-year contracts).Project 1:You will contribute to some of our ongoing investigations to develop new ultrafast femtosecond to attosecond time-scale semiconductor spectroscopy, imaging and metrology techniques in the soft-X-ray spectral range based on a laboratory-based high-harmonic generation....

Are you interested in simultaneously unraveling the fundamentals of wear and contributing to the solution of friction-related challenges in computer chip production? At the Advanced Research Center for Nanolithography, we work with ASML on new processes to fabricate the electronic chips that power nearly every sector in the world. These chips are fabricated onto silicon....

Optical metrology is a key ingredient of nanolithography, as it enables control of important parameters like overlay. High-resolution imaging is an essential part of optical metrology since metrology is often done on small test patterns that are surrounded by device structures. Digital Holographic Microscopy (DHM) is a promising approach for optical metrology, as it can....

Plasma discharges in gases create extremely challenging environments for surfaces. Protective coatings are often required to maintain the integrity of plasma-facing materials. However, plasma-induced etching of material and the diffusion of small elements such as hydrogen present challenges even for optimized materials and their coatings. In this project, you will perform in situ studies of....

Work Activities ————— Are you interested in simultaneously unraveling the fundamentals of wear and contributing to the solution of friction-related challenges in computer chip production? At the Advanced Research Center for Nanolithography, we work with ASML on new processes to fabricate the electronic chips that power nearly every sector in the world. These chips are....

Activation of molecules in a plasma can form the basis for efficient chemical reactions making direct use of electrical energy. The interaction of plasma-activated species with a catalyst enhances the efficiency of these reactions. However, at present the active state of catalyst surfaces in plasma is unknown, limiting the impact of plasma catalysis by inhibiting....

Work Activities ————— This fully funded PhD position is part of a Holland High Tech (TKI HTSM) grant titled “Imaging Spectroscopy for Broadband EUV Source Size Characterization (ImSpec)”, a collaboration between the Advanced Research Center for Nanolithography (ARCNL) and University of Twente (UT). Background Laser-produced tin plasmas are the sources of extreme ultraviolet (EUV) radiation....

Work Activities ————— This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Consolidator Grant from the European Research Council titled “Next-Generation Light Source: Driving plasmas to power tomorrow’s nanolithography (MOORELIGHT)”. BackgroundAdvanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just....

Work Activities ————— Optical metrology is a key ingredient of nanolithography, as it enables the characterization of critical features of nanostructures printed on wafers. High-resolution imaging is an essential part of optical metrology: We need to perform fast imaging with the highest spatial resolution through a simple and compact imaging probe. Computational imaging is a....